The UV fused silica laser mirror is designed with a precision-polished fused silica substrate and multilayer dielectric coating, Achieve up to >99.5% reflectivity in the 244–1064 nm band (center band optimization) With low scatter and high thermal stability, it ensures optimal performance for lasers, medical imaging, and optical communication systems.
Material :
UV Fused SilicaWavelength Range :
244nm–1064nmDimension Tolerance :
+0.0 / -0.1 mmThickness Tolerance :
±0.2 mmSurface Accuracy :
λ/10 @633nmParallelism :
<3 arcminIrregularity(P-V) :
λ/8 @ 633 nmSurface Quality :
10-5Edge Bevel :
Protective Bevel 0.2~0.5mmX45°Reflectivity :
Ravg>99.5%
Product Description
The laser mirror uses UV-grade fused silica as the substrate, offering exceptional thermal stability and minimal absorption—ideal for high-power laser systems. The high-reflectivity dielectric coating (HR coating) covers UV, visible, and NIR wavelengths, achieving >99.5% reflectivity at key laser wavelengths such as 1064nm (YAG) and 488nm (Ar⁺ laser).
Available in 0° and 45° coating designs, it supports versatile optical layouts with minimal loss. With 10-5 surface quality and λ/10 flatness @633nm, it delivers superior beam fidelity and system accuracy. The ground back surface enhances mechanical mounting and reduces stray reflections, making it ideal for both research and industrial-grade laser platforms.
Performance Advantages
High transmission across UV–NIR spectral range
λ/10 flatness and <5″ parallelism for minimal distortion
Excellent laser damage resistance for high-power systems
Precision-polished and annealed for optical stability
Customizable sizes and coatings
Application Range
Laser cutting head protective window
Laser output window and beam protection
Optical testing and metrology systems
Industrial and scientific optical protection systems
Observation and sensor protection window
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